منابع مشابه
Characterization of CrBN films deposited by ion beam assisted deposition
of CrBN films deposited by ion beam assisted deposition" (2002). This article reports on the growth and analysis of CrBN nanocrystalline materials using an ion beam assisted deposition process. In addition, this article addresses the utilization of spectroscopic ellipsometry for in situ analysis of ternary nitrides. Coatings, with a total thickness of 1.5 Ϯ0.2 m, were deposited at low temperat...
متن کاملTexture development mechanisms in ion beam assisted deposition
Three-dimensional molecular dynamics simulations of ion beam assisted deposition ~IBAD! are performed to determine the mechanisms of crystallographic texture selection during the IBAD of polycrystalline films. A face centered cubic bicrystal consisting of @111# and @110# oriented grains is grown while an ion beam bombards the growing film at normal incidence. As the film grows, the grain bounda...
متن کاملComparative study of IR and UV laser damage resistance of silica thin films deposited by Electron Beam deposition, Ion Plating, Ion Assisted Deposition and Dual Ion Beam Sputtering
The laser damage resistance of optical coatings is a critical point for a large number of applications. However improving this resistance is often hard to obtain because of the large number of parameters in the deposition processes than can modify the laser damage threshold and the lack of detailed and exploitable studies published on this subject. Then, the aim of this work is to test and anal...
متن کاملBiased Target Ion Beam Deposition of GMR Multilayers
– Multilayers like those used in giant magnetoresistive spin-valves can be improved if better layer thickness uniformity, lower contamination levels, reduced interfacial roughness and less interlayer mixing can be achieved. Atomistic simulations have revealed that optimization of the energy of the depositing atoms and the application of very low energy inert gas ion assistance reduce both inter...
متن کاملLaser damage resistance of silica thin films deposited by Electron Beam Deposition, Ion Assisted Deposition, Reactive Low Voltage Ion Plating and Dual Ion Beam Sputtering
The laser damage resistance of optical coatings is a key point for a large number of applications. The aim of this work is to test and analyze the laser damage resistance of a thin film material commonly used for high power applications (SiO2) and deposited with different techniques: Electron Beam Deposition, Ion Assisted Deposition, Low Voltage Reactive Ion Plating and Dual Ion Beam Sputtering...
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ژورنال
عنوان ژورنال: Journal of the Japan Society for Precision Engineering
سال: 1990
ISSN: 1882-675X,0912-0289
DOI: 10.2493/jjspe.56.1185